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Kenta Arima

Atomic scale imaging, manipulation, and spectroscopy Mechanical and electrical properties of molecules in self-assembled films Ambient pressure photoelectron spectroscopy for environnemental sciences Studies of friction, adhesion, and wear at the nanometer scale Electronic, mechanical, and chemical properties of nanoclusters Structure of thin liquid films and wetting Nanoscale material imaging and manipulation (Molecular Foundry) Catalytic and chemical properties of surfaces

Updated by Franck, December 11 2007

Kenta Arima
Visitor, Assistant Professor Osaka University

Materials Sciences Division
Mail stop 66R02206 (Office 67-1235)
Lawrence Berkeley National Laboratory
1 Cyclotron Road, Berkeley, California 94720 USA

Phone: +1-510-486-5495
FAX: +1-510-486-7268
Email: Karima*lbl.gov (replace * by @)

Homepage: Osaka University

I am a visiting scholar in Salmeron’s group (Materials Sciences Division).  In this laboratory, I aim at elucidating interactions between water and alkali halides on SiO2 substrates on the nanometer scale for the understanding of tropospheric chemistry.  I am collaborating with Peng Jiang in SPFM (Scanning Polarization Force Microscopy) observations and APPES (Ambient Pressure PhotoElectron Spectroscopy) measurements at ALS..

Education
Ph.D. in Engineering, Osaka University, Osaka, Japan (March 2000)
Master in Engineering, Osaka University, Osaka, Japan (March 1997)
Bachelor in Engineering, Osaka University, Osaka, Japan (March 1995)

Professional Experience

2000-(present).
Assistant Professor
Department of Precision Science and Technology
Graduate School of Engineering
Osaka University, Japan

1997-2000.
Junior Research Associate
The Institute of Physical and Chemical Research (RIKEN), Japan

Honors

Image of the Month (December 2005, RHK Technology)
Award for Encouragement of Research in Materials Research Society in Japan (1996)

Selected Publications

1.K. Arima, H. Hara, J. Murata, T. Ishida, R. Okamoto, K. Yagi, Y. Sano, H. Mimura and K. Yamauchi
Atomic-scale flattening of SiC surfaces by electroless chemical etching in HF solution with Pt catalyst
Appl. Phys. Lett., 90 (2007) 202106.

2.T. Shigetoshi, H. Inoue, T. Kawashima, T. Hirokane, T. Kataoka, M. Morita and K. Arima
Microscratches with Depths of Angstrom Order on Si Wafers Detected by Light Scattering and AFM
Electrochem. and Solid-State Lett., 10 (2007) H206.

3.K. Arima, A. Kubota, H. Mimura, K. Inagaki, K. Endo, Y. Mori and K. Yamauchi
Highly resolved scanning tunneling microscopy study of Si(001) surfaces flattened in aqueous environment
Surf. Sci., 600 (2006) L185.

4.K. Arima, J. Katoh, S. Horie, K. Endo, T. Ono, S. Sugawa, H. Akahori, A. Teramoto and T. Ohmi
Hydrogen termination of Si(110) surfaces upon wet cleaning revealed by highly-resolved scanning tunneling microscopy
J. Appl. Phys., 98 (2005) 103525.

5.K. Arima, J. Katoh and K. Endo
Atomic-scale analysis of hydrogen-terminated Si(110) surfaces after wet cleaning
Appl. Phys. Lett., 85 (2004) 6254.

Research Interests

scanning probe microscopy, surface analysis, semiconductor material/process and device, environmental science, catalysis